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Type of equipment | Name of equipment | Location | Contact person | Link to more information |
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XRD | Routine Powder Diffractometer (DaVinci1) | KII-113 | Contact person | Routine powder XRD |
XRD | Powder diffractometer (D8 Focus) | KII-113 | Contact person | 9-pos Powder XRD |
XRD | Thin-film Diffractometer (D8 Discover) | KII-113 | Contact person | D8 Discover |
XRD | Multipurpose Powder X-ray diffractometer (DaVinci2) | KII-113 | Contact person | Multipurpose XRD |
XRD | Non-ambient X-ray diffractometer (D8 Advance) | KII-113 | Contact person | Non-ambient XRD |
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Solar cell silicon characterisation
Type of equipment | Name of equipment | Location | Contact person | Link to more information |
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Si - Characterisation | Nicolet 6700 FT-IR | M-104 | Chiara Modanese | |
Si - Characterisation | µLPCD resistivty life time measurment | M-104 | Gaute Stokkan (SINTEF) | |
Si - Characterisation | SiWaScan | M-104 | Gaute Stokkan (SINTEF) | |
Si - Characterisation | micro cracks characterisation | M-104 | Kai Erik Ekstrøm | |
Si - Characterisation Crystal deffect mesurment | PVSCAN 6000 | M-104 | Gaute Stokkan (SINTEF) | |
Si - Characterisation Density Imaging | CDI-Carrier | M-104 | Gaute Stokkan (SINTEF) |
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Inductively coupled plasma mass spectrometry (ICP-MS)
Type of equipment | Name of equipment | Location | Contact person | Link to more information |
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ICP-MS | Perkin Elmer NexION 5000 | KII-321 | Henrik Ness |
Electrical resistivity measurement
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